車祐成 (Karras Che)

E-mail: [email protected]

Tel: 0961297698

Semiconductor Process  / Electrochemical Energy Storage material Research / X-Ray analysis
<Passion / Positive / Communication >

Semiconductor Wet clean Process tech 5nm → 3nm High-K metal gate
Electrochemical Energy Storage_The material research of Supercapacitor
Electrochemical analysis (CV , CP & EIS )
X-ray analysis (XRD , XAS , & XPS)

Work Experiment

tsmc, Process Engineer, Mar 2020 ~ Jul 2021

Middle End Wet Clean Process (High-K metal gate 5nm --> 3nm technology)
(1)Tool maintaintion
(2)Inline/offline SPC analysis and management
(3)Inline defect improvement
(4)Experiment analysis & Factor adjustment
(5)3nm technology tool inspection

Trouble shooting Experience
1.__The different of tools etching rate
    We studied the paper about O3 chemical and worked with equiment engineer to finding the root cause then adjust the tool pipeline and the O3 generator concentration to solve the tools etching rate non-matching issue.

2.__Inline SPC target issue
   By correlation  to find pre-process recipe change then revise the target of SPC.

3.__Inline arcing defect issue
    In order to solve defect issue by studying the property of etching chemical (HCl,DICO2 water & DI water) then arranged the sequence of doing etching chemical.

4.__ The different of etching chemical concentration
    Two O3 generators concentration non-matching issue by studying the relationship between the O3 concentration and the amount of DICO2 mixing .By changing the pipeline of equiment to reduce O3 escaping .


National Synchrotron Radiation Research Center (NSRRC)

Research Assistant, Aug 2019 ~ Oct 2019

1.Work -- Chemical /Lab mantaintion、Lab Keeper、MOST proposal apply
2.Research -- NSRRC X-ray Diffraction (XRD) , X-ray absorption spectroscopy (XAS) ,X-ray  photoelectron spectroscopy (XPS) and the energy storage principle of supercapacitor


NTHU X NSRRC, Student X Part-time Research Assistant , Aug 2016 ~ Aug 2019

1.The thesis--High Working Voltage V2O5//MnO2 Asymmetric Solid State Supercapacitor
2.Paper publish --M.-J. Deng*, K.-W . Chen, Y.-C. Che,I.-J. W ang, C.-M. Lin,J.-M. Chen, K.-T.        Lu, Y .-F.Liao, and H. Ishii, ACS Appl. Mater. Interfaces 2017, 9, 479−486
3.Conference-- 2018年中華民國介面科學學會年會既科技部計畫成果發表會--Oral        

    presentation champion
4.Foreign experiment-- To Japan Synchrotron Radiation Research Center(Spring-8)  using high power XPS to analysis the energy storage principle of supercapacitor



Projects 01 00@2x

M.-J. Deng*, K.-W . Chen, Y.-C. Che,I.-J. W ang, C.-M. Lin,J.-M. Chen, K.-T. Lu, Y .-F.Liao, and H. Ishii, ACS Appl. Mater. Interfaces 2017, 9, 479−486

Projects 01 00@2x

2018年中華民國介面科學學會年會既科技部計畫成果發表會--Oral presentation champion


National Tsing Hua University, (MS) Department of Engineering and System Science, 2017.09 ~ 2019.08


National Tsing Hua University, (BS)Department of Applied Science, 2013.09 ~ 2017.08



Professional Field


2.Cyclic Voltammetry (CV)

3.Electrochemical Impedance Spectroscopy (EIS)

4.X-ray Diffraction (XRD) 

5.X-ray absorption spectroscopy (XAS) 6.X-ray photoelectron spectroscopy (XPS)

Semiconductor Process

1.Wet Clean Middle End Process

2.High-K metal gate




Powered by CakeResumePowered by CakeResume