7 years of experiences in advanced node OPC & lithography , with excellent skills for EUV/DUV lithography of mask data process & teamwork organization . Extreme familiarity with related EDA tools & OPC Lithography related skills , able to develop for leading-node OPC techniques.
Aug 2020 - now
Role of leader with advanced node OPC developing , data process tuning , optical simulation & modeling , key solution provider for physical resolution extreme-limited dimension with challenge lithography layout , successful with advanced node OPC from R&D stage to production line .
Jul 2019 - Aug 2020
Early Research in field with EUV lithography tech. , optical simulation & modeling for EUV physical resolution extreme-limited dimension layout , teamwork organization of related groups and successful build with first advanced node EUV-OPC : state-of-art with EUV litho-processing .
Sep 2014 - Jul 2019
Focus on production maintenance and trouble-shooting , study of cost-reduction in data process flow and keep high-quality , speed-up data flow . benefit of 30%/year cost in advanced node & mature node mask data processing .
Sep 2011 - Jun 2013
master degree of Photonics and optoelectronic
Sep 2007 - Jun 2011
bachelor degree of Photonics and optoelectronic