Shiuan-Li Lin (林軒立)

Leading node development & path-finding:
- Successfully developed with advanced node OPC, in which DUV/EUV limited pitch layout
- Break-through thinking to solve process issues & limitations
Problem-solving and quality assurance:
- Key solution provider for fabrication of critical issues, implemented into production
- Build-up with reverse logical verification mechanism
Experience :
- 7 years of experience in OPC & lithography
- Data Science & Data analysis
- Python , C++ , Perl & EDA related tools

Work Experiences

Aug 2020 - now

Role of leader with challenge OPC development
In-house functions developed & applied in python-based code, enlarged process-window for fabrication
Develop curvilinear shape DOM/SB in OPC approach

Jul 2019 - Aug 2020

Successful build-up with the first extreme pitch EUV-OPC
SMO tuning/OPC modeling in the field with EUV lithography
Recipe tuning to solve critical EUV lithography issues, including pitch-relaxing & slit-effec

Sep 2014 - Jul 2019

Ensure delivered in-house solution to keep high-quality, speed-up data processing & maintenance
E-beam writer of data re-structure : Benefit of 10%~25% mask exposure cost by software solution
New Re-tape-out Flow of double-patterning technique (DPT) & OPC consistency : minimum process variation & quality insurance
Benefit of 30%/year cost in mask data processing

Sep 2011 - Jun 2013

master's degree in Photonics and optoelectronic

Sep 2007 - Jun 2011

bachelor's degree in Photonics and optoelectronic