Shiuan-Li Lin (林軒立)


  • Leading node development & path-finding:
    • Successfully developed with advanced node OPC, in which DUV/EUV limited pitch layout
    • Break-through thinking to solve process issues & limitations
  • Problem-solving and quality assurance:
    • Key solution provider for fabrication of critical issues, implemented into production
    • Build-up with reverse logical verification mechanism
  • Experience :
    • 7 years of experience in OPC & lithography
    • Data Science & Data analysis
    • Python , C++ , Perl & EDA related tools

Work Experiences

Project leader engineer  •  TSMC

Aug 2020 - now

  • Role of leader with challenge OPC development 
  • In-house functions developed & applied in python-based code, enlarged process-window for fabrication
  • Develop curvilinear shape DOM/SB in OPC approach

R&D OPC engineer  •  TSMC

Jul 2019 - Aug 2020

  • Successful build-up with the first extreme pitch EUV-OPC
  • SMO tuning/OPC modeling in the field with EUV lithography
  • Recipe tuning to solve critical EUV lithography issues, including pitch-relaxing & slit-effec  

Senior engineer  •  TSMC

Sep 2014 - Jul 2019

  • Ensure delivered in-house solution to keep high-quality, speed-up data processing & maintenance
  • E-beam writer of data re-structure : Benefit of 10%~25% mask exposure cost by software solution
  • New Re-tape-out Flow of double-patterning technique (DPT) & OPC consistency : minimum process variation & quality insurance
  • Benefit of 30%/year cost in mask data processing

Education

Sep 2011 - Jun 2013

National Taiwan University

master's degree in Photonics and optoelectronic

Sep 2007 - Jun 2011

National Cheng Kung University

bachelor's degree in Photonics and optoelectronic

Skills

Language


  • Data Science & Data analysis
  • OPC , EDA related tools 
  • Python , C++ , Perl
  • Mask data process

  • Chinese - Native
  • English - Professional
Powered by CakeResumePowered by CakeResume