● Use spectrum analysis and simulation to do troubleshooting and increase precision to angstrom scale for High-K metal gate process improvement
● Establish a chart review method such as correlation bias between different High-K processes with the same film stack and solve the process shift issue in two days.
● By using SQL and VBA to increase data query efficiency about daily chart review for team members from 3 hours to less than 1 hour.
● Fix urgent system bugs in one day by strongly collaborating with IT and related members such as Manufacturing to reduce the impact on production.
● Distinguish wafer lifetime by pointing out the notch alignment fail issue which is a long-term potential risk for quality from N10 in one week.