朱思明 (Chu Szu Ming)
Motivated engineer who is highly energetic, outgoing and tenacity. Have project management experience. Ability to solve problems and rich cost down/capacity max out experience. Co-working with foreigners experience. Quickly learn and master new concepts and skills.
工作經歷
OCT CPEE CVD/PVD Sr. Engineer • Micron Technology 台灣美光
九月 2022 - 六月 2023
Integrate supplier resources to reduce company cost and improve capacity.
ADTT PVD Sr. Engineer • Micron Technology 台灣美光
七月 2020 - 九月 2022
1.Published Micron internal paper in FY22.
2.TF line yield owner, and scrap wafer improve around 40%.
3.Contact Co/SICONI recipe optimization.
4.Digit line W sputter recipe development for RS reduction.
5.W/SIN capacity improve 5%~8% for max out project.
JTC Film Team Sr. Engineer • Micron Technology 台灣美光
十二月 2018 - 七月 2020
1.Development Ti/WN/WSI metal sputter recipe for digit line RS reduction
2.New tech process transfer form US RD team.
PEE PVD Sr. Engineer • Micron Technology 台灣美光
七月 2016 - 十二月 2018
1.SPC champion, responsible for PVD team meet SPC KPI.
2.Responsible backend layers defect/cost/max out projects.
3.TSV Cu process transfer from JP RD team.
TF Technology Development Engineer • Macronix International Co., LTD
八月 2012 - 七月 2016
1.Published paper “Capacitance density and breakdown voltage improvement by optimizing the PECVD dielectric film characteristics in metal insulator metal capacitors” in IEEE symposium 2015
2.Responsible for Logic Foundry Thin Film process development
TF Process Engineer • Macronix International Co., LTD
四月 2008 - 八月 2012
1.. NOR/NAND-Flash memory yield and capacity improvement.
2. Thin Film PVD/CVD Process maintenance.
3. CIP competition received Honorable Mention.
技能
- Process improvement
- Project Management
- Resource Coordination
- Problem Solving skill
- Multitasking skill
語言
- Chinese — 母語或雙語
- English — 中階
- Japanese — 初階
學歷
中原大學 Chung Yuan Christian University
Master of Physics
2004 - 2006
