6+ years experienced metrology engineer of process technologies at Taiwan Semiconductor Manufacturing Company (N06/N07/N22/N28).
3+ years in 6nm/7nm process, found path for optical metrology & quality control.
3+ years in 22nm/28nm litho-related metrology & 2nd mask quality sponsor.
Personality, well communicating with cross-department/learning fast/work smart/willing to accept new challenges.
Extremely interested in companies located in Taichung/Taipei/Taoyuan or the USA.
九月 2018 - Present
•N6/N7 Optical Critical Dimension (OCD) metrology owner (Recipe/Quality Control/Productivity.etc)
•OCD 2D/3D library model building for inline new monitor create & path-finding.
•Co-work with PID/Module for OCD inline issue & metrology solution.
•Developed metrology methodology (ex:Machine learning for spectrum analysis , Sense-array .etc)
•N7 wafer container quality owner (Foup dimension/Inspection/AMC Gas analyzer)
十一月 2015 - 九月 2018
•N28 Critical Dimension Electron Microscope (CD-SEM) metrology sponsor.
•LIT defect scanner (Viper/OM) sponsor for lithography-related defect monitor.
•Thermal-wave (OP) sponsor for lithography photo-resist thickness defense.
•2nd version Mask qualified by handling experiment lot pi-run CD/KLA scan & WAT analysis .
2012 - 2014
2008 - 2012