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Avatar of Yu-Ta,Wu.
Yu-Ta,Wu
Metrology Engineer
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Yu-Ta,Wu

Metrology Engineer
Experienced metrology engineer with 6+ year of process technologies in Taiwan Semiconductor Manufacturing Company (N06/N07/N22/N28). 3+ years in 6nm/7nm process, found path for optical metrology. 3+ years in 22nm/28nm litho-related metrology & 2nd mask quality sponsor. Personality, good communicated with cross-department/learning fast/work smart/willing to accept new challenge. Extremely interested in companies located in Taichung/Taipei/Taoyuan or the USA.
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Taiwan Semiconductor Manufacturing Company(TSMC)
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National Chiao Tung University
Taichung, 台灣

Professional Background

  • Current status
  • Profession
    Semiconductor Engineering
  • Fields
    Semiconductor
  • Work experience
    6-10 years (6-10 years relevant)
  • Management
    None
  • Skills
    Optical measurement
    cdsem
    Metrology
    Semiconductor Process
    TFT LCD Array Thin Film Process
  • Languages
    English
    ・
    Intermediate
    Chinese
    ・
    Native or Bilingual
  • Highest level of education
    Master

Job search preferences

  • Desired job type
    Full-time
    ・
    Interested in working remotely
  • Desired positions
    Metrology Engineer
  • Desired work locations
  • Freelance
    Non-freelancer

Work Experience

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Metrology Engineer (OCD)

Taiwan Semiconductor Manufacturing Company(TSMC)
Sep 2018 - Present
•N6/N7 Optical Critical Dimension (OCD) metrology owner (Recipe/Quality Control/Productivity.etc) •OCD 2D/3D library model building for inline new monitor create & path-finding. •Co-work with PID/Module for OCD inline issue & metrology solution. •Developed metrology methodology (ex:Machine learning for spectrum analysis , Sense-array .etc) •N7 wafer container quality owner (Foup dimension/Inspection/AMC Gas analyzer)
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Mask & Metrology Engineering

Taiwan Semiconductor Manufacturing Company(TSMC)
Nov 2015 - Sep 2018
・
2 yrs 11 mos
•N28 Critical Dimension Electron Microscope (CD-SEM) metrology sponsor. •LIT defect scanner (Viper/OM) sponsor for lithography-related defect monitor. •Thermal-wave (OP) sponsor for lithography photo-resist thickness defense. •2nd version Mask qualified by handling experiment lot pi-run CD/KLA scan & WAT analysis .

Education

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National Chiao Tung University

Master’s Degree
・
Display Institute
2012 - 2014
Activities and societies
Class president of Display Institute (2012-2014)
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National Chiao Tung University

Bachelor’s Degree
・
Department of Photonics
2008 - 2012
Activities and societies
Photonics Student Association member (2008-2009) Dancing club member (2008)