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Avatar of Shengzhe Hong.
Shengzhe Hong
Product Device Engineer
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Shengzhe Hong

Product Device Engineer
TSMC product engineer (Device team), involved in FinFET tech, such as N5/ N12/ N16. Specialize in WAT analysis, be able to logically identify potential electrical problems. In addition, I have good communication skills and rich experience in X-dep. work. Extremely interested in companies located in Taipei/Hsinchu or United States. If you have any related opportunity, please feel free to contact me, many thanks.
Taiwan Semiconductor Manufacturing Company (TSMC)
Tsinghua University
Taiwan

Professional Background

  • Current status
    Employed
  • Profession
    Product Engineer
  • Fields
    Semiconductor
  • Work experience
    2-4 years (2-4 years relevant)
  • Management
    I've had experience in managing 15+ people
  • Skills
    WAT analysis
    FinFET
    Semiconductor Process
    Yield analysis/enhancement
    CMOS Technology
    Electrical analysis
  • Languages
    English
    ・
    Professional
    Chinese
    ・
    Native or Bilingual
  • Highest level of education
    Master

Job search preferences

  • Desired job type
    Full-time
    ・
    Interested in working remotely
  • Desired positions
    Product Device Engineer
  • Desired work locations
    Hsinchu City, Taiwan 300
  • Freelance
    Part-time freelancer

Work Experience

Product Device Engineer

Taiwan Semiconductor Manufacturing Company (TSMC)
Aug 2020 - Present
• N5 mass production owner by WAT analysis, find out the potential electrical abnormality. • Device (RO%) boost by Speed/Iddq/Vts/Isat/DIBL/LC/SC/Sws tracking analysis. • Customer handling, ex: HPC Project/ S2S/ Wafer uniformity improvement (IDU/VtU/SPU). • Yield analysis (Mbist/ LVccmin/ IDS/ Repair/ Chain scan) to develop the yield loss spec. • SPICE model setting/ Corner skew methodology (FF/SS/FS/SF). • Reliability (RA) improvement (HTOL/ TDDB) BKM check with QR team.

Product Device Engineer

Taiwan Semiconductor Manufacturing Company (TSMC)
Sep 2018 - Jul 2020
・
1 yr 11 mos
• N12/ N16 mass production (MP) owner by WAT analysis. • Support Nanjing fab (F16) MP and NTO ramp-up/ RTO/ Corner split provider. • Customer handling: RO%/Speed/Iddq boost by tuning process, like Poly/Fin/ EPI/ Metal gate. • N12/16 SPICE model setting: Co-work with TDID and SPICE model team to set the SPICE. • Deeply understand the correlation between inline (process) and WAT index.

Research Assistant

Tsinghua-Foxconn Nanotechnology Research Center
Aug 2015 - Jul 2018
・
3 yrs 0 mos
• Research focus on the 2D materials, like graphene and transition-metal dichalcogenides. • Study the irradiation effect on graphene-MoS2 heterostructure. Through controlling the electron-beam dose to observe the changes of physical properties. • Design lithographic mask and conduct electrical measurements independently.

Education

Tsinghua University

Master’s Degree
・
Master's degree Material Science
2015 - 2018

National Taipei University of Technology

Bachelor’s Degree
・
Bachelor's degree Material science
2011 - 2015