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very important to me both in the graduate school and in the company. I hope that I have opportunity to try my best for your company with my extensive experience. Process Integration Engineer, TSMC, Tainan, Taiwan [email protected] Semiconductor (5nm~90nm) Device engineering Semiconductor Process WAT Analysis Yield Analysis Process Quality Test Manufacturing Statistical Process Control (SPC) Cp/Cpk Failure Mode and Effects Analysis (FMEA) Design of Experiments (DOE) PDCA 3-Leg-5-Why 8D Pareto Chart Box Plot & Normal Quantile Plot Failure Analysis Tool JMP software Transmission Electron Microscopy (TEM) Energy-dispersive X

TSMC) JulyApril 2014 Process integration engineer from 20nm to 40nm - 55/65nm - 90nm and other mature technologies 1. Mature technology node: Customer handling (including new tape-out, low yield analysis, WAT, SPC chart) 2. Advanced technology node: 20nm process transfer from Hsinchu to Tainan, and 2P2E-DUV pitch 64nm Cu-interconnect process development EducationNational Yang Ming Chiao Tung University Electrical Engineering & IC designChang Gung University，CGU Electrical Engineering Department Personal advantage Strong learning ability Good at teamwork High problem solving ability Skills Reliability improvement Defect reduction Process Integration Yield Enhancement Failure Analysis Language English — Intermediate Japanese — Elementary

Plan review Technical document Project Management As an EE team leader, in charge of Lead 13 engineers for electrical hardware design. Technical consulting Failure analysis and issue solution suggestion Program/Project management Li-ion cell analysis, evaluation, and selection Specification, test plan, and BOM review Engineering or technical training New solution evaluation Design guideline establish Reference circuit establish Common layout and schematics library establish Design rule establish Sr. Engineer • United Microelectronics Corporation (UMC) 五月九月 2006 TI 65nm & 45nm project Preside over WAT test results and analysis and provide advice and sugges...

分析 文字探勘 統計分析 Embedded System Raspberry pi Arduino NVIDIA Jetson AGX Xavier IDE Git: 版本管理、維護 Visual studio:.NET Windows Forms 開發 Pychram:python 專案開發 RStudio: R 語言開發 UMC Project 1- WAT TEL 自動對針 WAT 機台每月大約有 200 次 Prober 異常。 Prober 異常每次處理時間約 4 mins，Prober 異常可能同時發生在不同機台，透過 RPA 平台

Term familiar internal system operation independently handle on-duty job Minitab/JMP learning for DOE Midterm Term Optimize Recipe for Cost Reduction FOAK/SOAK/Retrofit Tool Evaluation Yield Improvement Long Term Be a qualified buddy/mentor Leader/Project owner promotion Manager/Instructor Position SWOT Analysis Strengths💪 Fundamental concepts for troubleshooting Quality mindset awareness Independently Problem solving Weakness Lesser Project Performance Rarely Executed DOE/JMP/FMEA Lack of Confidence Opportunities 💡 Realize various types of Principle/ RCM application Integrate Different Module/Position New Development Process Threats Lower Education WAT/

Judy Yang 楊千慧 Brand Manager- WAT Cocktail Taipei City, Taiwan A self-motivated, proactive, data-driven and result-oriented trilingual marketing professional who has a clear and sharp mind at work. Great at coming up with creative ideas and always well-prepared with logical thinking. As an open minded team member and a fast learner, I already have over 6 years of experience in marketing with multiple international brands across different fields, such as Skincare, F&B, Sports Retail and the Alcohol Industry. Skilled in Mar-com, digital communication, NPD launch and brand management.

in the honor of the third best grading prize.(5.88%) Work Experience Genesis Photonics , Process Engineer, Dec 2020 ~ Now Process engineers, Responsible for process optimization and yield improvement Lithography Process Engineer mini LED photolithography technology Evaluation of introduction of photoresist Batch verification (STR、TECN、ECN) Verification of WAT Yield and chip profile Set new part number of photoresist Monitor the yield of mask and products through AOI, to improve appearance yield of product. Photolithography process troubleshooting Accuracy <0.5 µm by mask aligner DirectAlign® mode new employee orientation 2. Improve of WAT yield