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車祐成
Engineer
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車祐成

Engineer
Semiconductor Engineer / Electrochemical Energy Storage material Research / X-Ray analysis <Passion / Positive / Communication > Semiconductor Wet clean Process tech 5nm → 3nm High-K metal gate Electrochemical Energy Storage_The material research of Supercapacitor Electrochemical analysis (CV , CP & EIS ) X-ray analysis (XRD , XAS , & XPS)
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Powerchip Semiconductor Manufacturing Corporation
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National Tsing Hua University
台灣桃園

Latar Belakang Profesional

  • Status sekarang
    Sudah bekerja
  • Profesi
    Process Engineer
  • Bidang
    Semikonduktor
  • Pengalaman Kerja
    2-4 tahun (relevan 2-4 tahun)
  • Management
    Tidak ada
  • Skil
    word
    excel
    powerpoint
  • Bahasa
    English
    Menengah
    Chinese
    Bahasa ibu atau Bilingual
  • Pendidikan tertinggi
    Master

Preferensi pencarian kerja

  • Jenis pekerjaan yang diinginkan
    Full-time
    Tertarik bekerja jarak jauh
  • Jabatan pekerjaan yang diinginkan
    元件工程師
  • Lokasi pekerjaan yang diinginkan
    Taipei City, Taiwan
    Taoyuan City, Taiwan
    Hsinchu City, Taiwan 300
    Taichung City, Taiwan
  • Bekerja lepas
    Non-pekerja lepas

Pengalaman Kerja

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Integration Technology Engineer

11/2021 - Sekarang
300mm Technology Foundry (Transfer and Production Integration ) ■ New Tape out ■ Process and WAT Window tunning ■ Process experiment CIP executing ■ In-line / Defect / WAT / Yield troubleshooting Achievement: (1) Platform improvements were executed through tape out, and pi run were excuted to design experimental splits to meet customer requirements. (2) WAT matching by understanding device characteristics and collaborating with Diffusion module through Design of Experiment (DOE) and the development of online recipe changes. (3) Yield improved~1% through the design of BEOL WET/Thin Film Continuous Improvement Processes (CIP) for defect model improvements in the cleanliness of process equipment.
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Process Engineer

tsmc
Full-time
03/2020 - 07/2021
1 yr 5 mos
MEOL HK Metal Gate Wet Clean Process Engineer from N5 to N3 technology ■Wet clean/etch tool maintenance and Productivity management. ■Inline/Offline SPC management and troubleshooting. ■Co-work with equipment engineer, process integration engineer to solve issues. Achievement: (1) N5 metal gate defect solution by studying the defect physical / chemical properties and designing continuous improvement process (CIP) . (2) Design of Experiment (DOE) for offline wafer Q-time effect issue. (3) New tech N3 tool wet etching rate improvement.
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Research Assistant Student

08/2015 - 10/2019
4 yrs 3 mos
Research: Electrochemical energy storage material research combined with synchrotron radiation_ X-Ray Diffraction ,X-Ray Absorption Spectroscopy and X-Ray Photospectroscopy analysis. Publication: M.-J. Deng*, K.-W . Chen, Y.-C. Che,I.-J. W ang, C.-M. Lin,J.-M. Chen, K.-T. Lu, Y .-F. Liao, and H. Ishii, ACS Appl. Mater. Interfaces 2017, 9, 479−486 The experience of oversea research: To analyz the material of supercapacitor by using 8 GeV energy synchrotron radiation at Spring-8 in Japan .

Edukasi

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Master of Science (MS)
Department of Engineering and System Science
2017 - 2019
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Bachelor of Science (BS)
Department of Applied Science
2013 - 2017