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車祐成
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車祐成

Engineer
Semiconductor Engineer / Electrochemical Energy Storage material Research / X-Ray analysis <Passion / Positive / Communication > Semiconductor Wet clean Process tech 5nm → 3nm High-K metal gate Electrochemical Energy Storage_The material research of Supercapacitor Electrochemical analysis (CV , CP & EIS ) X-ray analysis (XRD , XAS , & XPS)
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Powerchip Semiconductor Manufacturing Corporation
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National Tsing Hua University
台灣桃園

职场能力评价

专业背景

  • 目前状态
    就职中
  • 专业
    制程工程师
  • 产业
    半导体
  • 工作年资
    2 到 4 年 (2 到 4 年相关工作经验)
  • 管理经历
  • 技能
    word
    excel
    powerpoint
  • 语言能力
    English
    中阶
    Chinese
    母语或双语
  • 最高学历
    硕士

求职偏好

  • 预期工作模式
    全职
    对远端工作有兴趣
  • 希望获得的职位
    元件工程師
  • 期望的工作地点
    台灣台北
    台灣桃園
    台灣新竹市
    台灣台中
  • 接案服务
    不提供接案服务

工作经验

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Integration Technology Engineer

2021年11月 - 现在
300mm Technology Foundry (Transfer and Production Integration ) ■ New Tape out ■ Process and WAT Window tunning ■ Process experiment CIP executing ■ In-line / Defect / WAT / Yield troubleshooting Achievement: (1) Platform improvements were executed through tape out, and pi run were excuted to design experimental splits to meet customer requirements. (2) WAT matching by understanding device characteristics and collaborating with Diffusion module through Design of Experiment (DOE) and the development of online recipe changes. (3) Yield improved~1% through the design of BEOL WET/Thin Film Continuous Improvement Processes (CIP) for defect model improvements in the cleanliness of process equipment.
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Process Engineer

tsmc
全职
2020年3月 - 2021年7月
1 年 5 个月
MEOL HK Metal Gate Wet Clean Process Engineer from N5 to N3 technology ■Wet clean/etch tool maintenance and Productivity management. ■Inline/Offline SPC management and troubleshooting. ■Co-work with equipment engineer, process integration engineer to solve issues. Achievement: (1) N5 metal gate defect solution by studying the defect physical / chemical properties and designing continuous improvement process (CIP) . (2) Design of Experiment (DOE) for offline wafer Q-time effect issue. (3) New tech N3 tool wet etching rate improvement.
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Research Assistant Student

2015年8月 - 2019年10月
4 年 3 个月
Research: Electrochemical energy storage material research combined with synchrotron radiation_ X-Ray Diffraction ,X-Ray Absorption Spectroscopy and X-Ray Photospectroscopy analysis. Publication: M.-J. Deng*, K.-W . Chen, Y.-C. Che,I.-J. W ang, C.-M. Lin,J.-M. Chen, K.-T. Lu, Y .-F. Liao, and H. Ishii, ACS Appl. Mater. Interfaces 2017, 9, 479−486 The experience of oversea research: To analyz the material of supercapacitor by using 8 GeV energy synchrotron radiation at Spring-8 in Japan .

学历

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Master of Science (MS)
Department of Engineering and System Science
2017 - 2019
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Bachelor of Science (BS)
Department of Applied Science
2013 - 2017