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Kled Chen Assistant Manager (Now) Software Engineer (9 years) Algorithm Developer (6 years) Machine Learning Engineer (3 years) Physics Master Financial Researcher [email protected] Skills Power Point / Excel / Office C++ / C / Python / Git Algorithm Development / Data analyse Machine Learning / Neuron network / Tensorflow / Keras / Autoencoder / CNN Physics 學歷 NATIONAL TAIWAN UNIVERSITY, Physics Master, 2008 ~ 2010 ‧ Magnetic Quantum Confinement and Interaction of Co Nanoislands Resolved by Spin-Polarized Scanning Tunneling Microscopy and Spectroscopy ‧ 2010 Physics Annual Meeting of the Physics Best Paper in Magnetics Material
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2014 ~ 現在
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90nm) Device engineering Semiconductor Process WAT Analysis Yield Analysis Process Quality Test Manufacturing Statistical Process Control (SPC) Cp/Cpk Failure Mode and Effects Analysis (FMEA) Design of Experiments (DOE) PDCA 3-Leg-5-Why 8D Pareto Chart Box Plot & Normal Quantile Plot Failure Analysis Tool JMP software Transmission Electron Microscopy (TEM) Energy-dispersive X-ray spectroscopy (EDX) Work Experience TSMC, Process Integration Engineer Nov 2014 ~ Present 5nm process experience for new product tape-out, yield/device improvement, process optimization and risk assessment. More than moore products' experience including 40/55/80nm high voltage (panel driver
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AI enigneer @, Coretronic Inc.
2019 ~ 現在
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Sinica 六月七月 2014 Develope interference lithography to fabricate nanchannels in efficeient way at Academia Sinica, and using atomic force microscope AFM to check the fabrication effectiveness. Conduct biological experiments with different type of optical spectroscopy, including total-internal-reflection spectroscopy TIRF, fluorescence spectroscopy, laser scanning confocal microscopy. Mental counsultant 298 Mechanized Infantry • Pingtong 八月六月 2010 Develope interference lithography to fabricate nanchannels in efficeient way at Academia Sinica , and using atomic force microscope AFM to check the fabrication effectiveness. Conduct biological experiments with different type of optical spectroscopy , including total-internal-reflection
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National Taiwan University
Master Applied Physics
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Alexander Fast, Ph.D. Developed solutions for different optical imaging and sensing applications from concept to working prototype. Design and sourcing of complete platforms including mechanical, optical, electronic, firmware and software analysis components. Seven years of experience with optical systems engineering and working in fast pace environments leading small teams and managing projects. Over 30 peer reviewed publications and conference proceedings in multiple fields including biomedical optics, photovoltaic materials, single-molecule chemistry and investigative dermatology. Integrated deep learning based image analysis to push boundaries of the hardware limitations in microscopy. Signal-to-noise
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Engineering Technician @Taiwan Semiconductor Manufacturing Co., Ltd.
2014 ~ 現在
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隊經理,幫忙處理球隊大小事務,更曾幫隊上設計出專屬的球衣及球帽,並帶領南科壘球社連續三次奪取南科陽光盃-壘球賽冠軍。 EducationNational Yunlin University of Science and Technology Applied Foreign Language Skill Language Word Excel PowerPoint Outlook Photoshop CorelDraw Scanning Electron Microscopy (SEM) Rudolph NSX115 Inspection Recipe Setup Rudolph NSX330 Series Inspection Recipe Setup Rudolph DragonFly Inspection Recipe Setup English — 專業 Japanese — 初階 Spanish — 初階
Word
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6 到 10 年
National Yunlin University of Science and Technology
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Biological Research Scientist @Cleveland Center for Membrane and Structural Biology
2015 ~ 現在
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s and PhD in Biology from the Case Western Reserve University . When finishing his postdoctoral studies, in the period from 1991 to 1994, he served as a Postdoctoral Fellow at the MRC Laboratory of Molecular Biology at the University of Cambridge. Rosenthal relies on molecular structures from electron microscopy (EM), x-ray crystallography, and nuclear magnetic resonance spectroscopy when conducing his studies. Doug’s studies have done great scientific contributions in the understanding of the cytoskeleton, organelles and membrane-trafficking intermediates, signal transduction pathways, cell cycle regulators, the organelle/protein recycling machinery, and cell-death pathways
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Case Western Reserve University
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Research Scientist @Cleveland Clinic - Lerner Research Institute
1995 ~ 2005
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this position from 2005 toMoreover, he has done a number of researches, affiliated with this university. In the period from 1995 to 2005, Doug Rosenthal worked as a research scientist at the Cleveland Clinic - Lerner Research Institute. For his research studies, Rosenthal relies on molecular structures from electron microscopy (EM), x-ray crystallography, and nuclear magnetic resonance spectroscopy. In addition, Douglas Rosenthal has authored two books: Atomic Evidence and The Body’s Motors. Research Scientist Cleveland, Ohio, US Work Experience Cleveland Center for Membrane and Structural Biology (CCMSB), Research Scientist, Jan 2015 ~ Present Cleveland Institute for
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Case Western Reserve University
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列印

Kuo-Lun Tai (Gordon)

Email : [email protected] - Phone:+886(0)921859681
Current Location: Hsinchu, Taiwan

3 years of work experience at TSMC, PhD in material science

  • 2 years of experience in N3 FinFET source drain epitaxy process development
  • 1.3 years of experience in material selection for next-generation EUV mask 
  • Ph.D major in 2D material synthesis and characterization
  • Proficient in English (IELS 7.5) 
  • Open to relocation

Work Experience

Section Manager  •  TSMC

Mar. 2024 - present

Led a 3-member team to develop next-generation EUV mask and pellicle materials.

RD mask engineer  •  TSMC

Nov. 2022 - Mar. 2024

EUV mask material development

1) Selected materials via optimizing optical properties and evaluating mask process feasibility for next-generation EUV (extreme ultraviolet lithography) mask. Published research result in 2023 SPIE with best paper award and filed related patent in USPTO. 

2) Led and coordinated universities (NYCU/NTHU), research institutions (ITRI/NSRRC), and suppliers to fabricate EUV mask blank. 

3) Collaborated cross-departmentally to develop mask etch and repair process for in-house wafer exposure verification. 

Front-end RD process engineer  •  TSMC

Nov. 2020 -  Nov. 2022 

CVD Epitaxy process development
1) Boosted wafer yield and device performance by 1.5% by CVD process paramter optimization for the N3/N3E FinFET source/drain.  

2) Collaborated cross-functionally and developed a machine-learning-based methodology for CVD Epitaxy process control.



                                                              1


Education


National Chiao Tung University (NYCU)

Department of Materials Science and Engineering

  2011.09 - 2015.06 Bachelor's 

2015.09 - 2020.09

 Ph.D.

University of Oxford

Department of Materials

2019.07 - 2020.08

Recognised Student

Skills 

2D materials (Academic/PhD major)

1) Chemical vapor deposition (CVD) synthesis and transfer for 2D transition metal dichalcogenides

2) Nanoscale characterization methodology : STEM/TEM, SEM, AFM, Raman, and PL

P-type Source Drain Epitaxy for FinFET

1)  Wafer-scale CVD process to boost device performance and yield for TSMC N3/N3E FinFET 

2) Machine-learning-based methodology to achieve auto process control 

3) Optimization of process control via SPC charts, basic JMP statistic and DoEs (Design of Experiments)

Next generation EUV mask material 

1) Physical vapor deposition (PVD) of alloy material   

2) Material Characterization methodology : TEM, AFM, XRR, XPS, XRD

3) RIE and E-beam repair process development for mask patterning  

Awards

1) 25th Lam Research Taiwan thesis Award : Honorable mention, Atomic-Scale Characterization of Heterophases and Defects in 2D Van Der Waals Transition Metal Dichalcogenides 

2) 2023 SPIE Photomask Technology BACUS Prize 2nd place, EUV APSM mask prospects and challenges

3) 2023 TSMC EBO Best Engineer Award


                                                                          2


Selected Publications

1) Shy-Jay Lin, Chien-Min Lee, Yen-Liang Chen, Lee-Feng Chen, Kuo-Lun Tai, Chien-Chao Huang, Frankie F. G. Tsai, “EUV APSM mask prospects and challenges,” SPIE Photomask Technology 2023.

2) Kuo-Lun Tai, Jun Chen, Yi Wen, Hyoju Park, Qianyang Zhang, Yang Lu, Ren-Jie Chang, Peng Tang, Christopher S. Allen, Wen-Wei Wu*, and Jamie H. Warner.* “Phase Variations and Layer Epitaxy of 2D PdSe2 Grown on 2D Monolayers by Direct Selenization of Molecular Pd Precursors,”  ACS Nano 2020.  

3) Kuo-Lun Tai, Chun-Wei Huang, Ren-Fong Cai, Guan-Min Huang, Yi-Tang Tseng, Jun Chen and Wen-Wei Wu.“Atomic-Scale Fabrication of In-Plane Heterojunctions of Few-Layer MoS2 via In Situ Scanning Transmission Electron Microscopy,” Small, 2020. 






















                                                                           3


履歷
個人檔案

Kuo-Lun Tai (Gordon)

Email : [email protected] - Phone:+886(0)921859681
Current Location: Hsinchu, Taiwan

3 years of work experience at TSMC, PhD in material science

  • 2 years of experience in N3 FinFET source drain epitaxy process development
  • 1.3 years of experience in material selection for next-generation EUV mask 
  • Ph.D major in 2D material synthesis and characterization
  • Proficient in English (IELS 7.5) 
  • Open to relocation

Work Experience

Section Manager  •  TSMC

Mar. 2024 - present

Led a 3-member team to develop next-generation EUV mask and pellicle materials.

RD mask engineer  •  TSMC

Nov. 2022 - Mar. 2024

EUV mask material development

1) Selected materials via optimizing optical properties and evaluating mask process feasibility for next-generation EUV (extreme ultraviolet lithography) mask. Published research result in 2023 SPIE with best paper award and filed related patent in USPTO. 

2) Led and coordinated universities (NYCU/NTHU), research institutions (ITRI/NSRRC), and suppliers to fabricate EUV mask blank. 

3) Collaborated cross-departmentally to develop mask etch and repair process for in-house wafer exposure verification. 

Front-end RD process engineer  •  TSMC

Nov. 2020 -  Nov. 2022 

CVD Epitaxy process development
1) Boosted wafer yield and device performance by 1.5% by CVD process paramter optimization for the N3/N3E FinFET source/drain.  

2) Collaborated cross-functionally and developed a machine-learning-based methodology for CVD Epitaxy process control.



                                                              1


Education


National Chiao Tung University (NYCU)

Department of Materials Science and Engineering

  2011.09 - 2015.06 Bachelor's 

2015.09 - 2020.09

 Ph.D.

University of Oxford

Department of Materials

2019.07 - 2020.08

Recognised Student

Skills 

2D materials (Academic/PhD major)

1) Chemical vapor deposition (CVD) synthesis and transfer for 2D transition metal dichalcogenides

2) Nanoscale characterization methodology : STEM/TEM, SEM, AFM, Raman, and PL

P-type Source Drain Epitaxy for FinFET

1)  Wafer-scale CVD process to boost device performance and yield for TSMC N3/N3E FinFET 

2) Machine-learning-based methodology to achieve auto process control 

3) Optimization of process control via SPC charts, basic JMP statistic and DoEs (Design of Experiments)

Next generation EUV mask material 

1) Physical vapor deposition (PVD) of alloy material   

2) Material Characterization methodology : TEM, AFM, XRR, XPS, XRD

3) RIE and E-beam repair process development for mask patterning  

Awards

1) 25th Lam Research Taiwan thesis Award : Honorable mention, Atomic-Scale Characterization of Heterophases and Defects in 2D Van Der Waals Transition Metal Dichalcogenides 

2) 2023 SPIE Photomask Technology BACUS Prize 2nd place, EUV APSM mask prospects and challenges

3) 2023 TSMC EBO Best Engineer Award


                                                                          2


Selected Publications

1) Shy-Jay Lin, Chien-Min Lee, Yen-Liang Chen, Lee-Feng Chen, Kuo-Lun Tai, Chien-Chao Huang, Frankie F. G. Tsai, “EUV APSM mask prospects and challenges,” SPIE Photomask Technology 2023.

2) Kuo-Lun Tai, Jun Chen, Yi Wen, Hyoju Park, Qianyang Zhang, Yang Lu, Ren-Jie Chang, Peng Tang, Christopher S. Allen, Wen-Wei Wu*, and Jamie H. Warner.* “Phase Variations and Layer Epitaxy of 2D PdSe2 Grown on 2D Monolayers by Direct Selenization of Molecular Pd Precursors,”  ACS Nano 2020.  

3) Kuo-Lun Tai, Chun-Wei Huang, Ren-Fong Cai, Guan-Min Huang, Yi-Tang Tseng, Jun Chen and Wen-Wei Wu.“Atomic-Scale Fabrication of In-Plane Heterojunctions of Few-Layer MoS2 via In Situ Scanning Transmission Electron Microscopy,” Small, 2020. 






















                                                                           3