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朱思明
Sr. Engineer
Motivated engineer who is highly energetic, outgoing and tenacity. Have project management experience. Ability to solve problems and rich cost down/capacity max out experience. Co-working with foreigners experience. Quickly learns and masters new concepts and skills.
Micron Technology 台灣美光
中原大學 Chung Yuan Christian University
Taichung, 台灣
Professional Background
- Statut ActuelSans Emploi
- ProfessionSemiconductor Engineering・Research / R&D
- FieldsSemi-conducteur
- Expérience professionnelle10 à 15 ans (10 à 15 ans pertinente)
- ManagementNone
- Skills
- LanguagesChinese・Natif ou BilingueEnglish・IntermédiaireJapanese・Débutant
- Highest level of educationMaster
Job search preferences
- Desired job typeTemps plein・Intéressé par le travail à distance
- Desired positionsSemiconductor Sr. Engineer, Manager
- Lieu de travail désiréTaiwan
- FreelanceJe ne suis pas indépendant
Work Experience
OCT CPEE CVD/PVD Sr. Engineer
Taichung City, Taiwan
Integrate supplier resources to reduce company cost and improve capacity.
ADTT PVD Sr. Engineer
Taichung City, Taiwan
1.Published Micron internal paper in FY22.
2.TF line yield owner, and scrap wafer improve around 40%.
3.Contact Co/SICONI recipe optimization.
4.Digit line W sputter recipe development for RS reduction.
5.W/SIN capacity improve 5%~8% for max out project.
JTC Film Team Sr. Engineer
Taichung City, Taiwan
1.Development Ti/WN/WSI metal sputter recipe for digit line RS reduction
2.New tech process transfer form US RD team.
PEE PVD Sr. Engineer
Taichung City, Taiwan
1.SPC champion, responsible for PVD team meet SPC KPI.
2.Responsible backend layers defect/cost/max out projects.
3.TSV Cu process transfer from JP RD team.
TF Technology Development Engineer
Hsinchu City, Taiwan 300
1.Published paper “Capacitance density and breakdown voltage improvement by optimizing the PECVD dielectric film characteristics in metal insulator metal capacitors” in IEEE symposium 2015
2.Responsible for Logic Foundry Thin Film process development
TF Process Engineer
Hsinchu City, Taiwan 300
1.. NOR/NAND-Flash memory yield and capacity improvement.
2. Thin Film PVD/CVD Process maintenance.
3. CIP competition received Honorable Mention.
Education
Master’s Degree
・
物理Activités et groupes
童軍團, 攝影社,
Description
“Percolation in Two-dimensional Nanoparticle Films from Colloidal Self-assembly” , 2007 , Physica Status Solidi (a) , vol.204 , p.1856-1862. (SCI期刊)